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Proceedings Paper

Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses
Author(s): Jae Hong Park; Hyun Ik Jang; Jun Yong Park; Seok Woo Jeon; Woo Choong Kim; Hee Yeoun Kim; Chi Won Ahn
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Paper Abstract

The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231N (19 March 2015); doi: 10.1117/12.2080980
Show Author Affiliations
Jae Hong Park, Korea National Nanofab Ctr. (Korea, Republic of)
Hyun Ik Jang, Korea National Nanofab Ctr. (Korea, Republic of)
Jun Yong Park, KAIST (Korea, Republic of)
Seok Woo Jeon, KAIST (Korea, Republic of)
Woo Choong Kim, Korea National Nanofab Ctr. (Korea, Republic of)
Hee Yeoun Kim, Korea National Nanofab Ctr. (Korea, Republic of)
Chi Won Ahn, Korea National Nanofab Ctr. (Korea, Republic of)

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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