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Proceedings Paper

Modeling extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method
Author(s): Po-Yen Lai; Shih-Hung Chen
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Paper Abstract

A one-dimensional (1D) collisional relativistic particle-in-cell (PIC) code with ionization processes has been developed to investigate the key semiconductor manufacturing device, i.e., the extreme ultraviolet (EUV) light source from laserproduced plasmas (LPP). Unlike hydrodynamic approach, the kinetic model describes laser heating, energy transport and ultrafast electron dynamics with least approximations. The two major numerical effects of PIC simulations, i.e., numerical self-heating and numerical thermalization, are also studied and mitigated in the collisional PIC model. The integrated numerical model is achieved by simulating the dense plasma using collisional PIC model and estimating EUV emission and mean opacities according to the respective weighted oscillator strengths of tin ions with charged states varying from 5+ to 13+.

Paper Details

Date Published: 16 March 2015
PDF: 8 pages
Proc. SPIE 9357, Physics and Simulation of Optoelectronic Devices XXIII, 93570E (16 March 2015); doi: 10.1117/12.2080518
Show Author Affiliations
Po-Yen Lai, National Central Univ. (Taiwan)
Shih-Hung Chen, National Central Univ. (Taiwan)

Published in SPIE Proceedings Vol. 9357:
Physics and Simulation of Optoelectronic Devices XXIII
Bernd Witzigmann; Marek Osiński; Fritz Henneberger; Yasuhiko Arakawa, Editor(s)

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