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Proceedings Paper

Parallel fabrication of wafer-scale plasmonic metamaterials for nano-optics
Author(s): S. Eslami; J. G. Gibbs; A G. Mark; Tung Chun Lee; H.- H. Jeong; I. Kim; Peer Fischer
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Paper Abstract

We describe how physical vapor deposition coupled with micelle-nanolithography-seeded substrates permits the growth of metamaterials with 3D structural and material control at the nanoscale. Novel plasmonic hybrid structures with tuned optical response from the UV to the near IR are demonstrated.

Paper Details

Date Published: 13 March 2015
PDF: 8 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 93740R (13 March 2015); doi: 10.1117/12.2080098
Show Author Affiliations
S. Eslami, Max-Planck-Institut für Intelligente Systeme (Germany)
J. G. Gibbs, Max-Planck-Institut für Intelligente Systeme (Germany)
A G. Mark, Max-Planck-Institut für Intelligente Systeme (Germany)
Tung Chun Lee, Max-Planck-Gesellschaft (Germany)
H.- H. Jeong, Max-Planck-Institut für Intelligente Systeme (Germany)
I. Kim, Max-Planck-Institut für Intelligente Systeme (Germany)
Peer Fischer, Max-Planck Institut für Intelligente Systeme (Germany)
Univ. Stuttgart (Germany)

Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)

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