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Proceedings Paper

Fabrication of 4, 5, or 6-fold symmetric 3D photonic structures using single beam and single reflective optical element based holographic lithography
Author(s): D. George; J. Lutkenhaus; D. Lowell; U. Philipose; H. Zhang; Z. Poole; K. Chen; Y. Lin
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Paper Abstract

Here we present the holographic fabrication of large area 3D photonic structures using a single reflective optical element (ROE) with a single beam, single exposure process. The ROE consists of a 3D printed plastic support that houses 4, 5, or 6-fold symmetrically arranged reflecting surfaces which redirect a central beam into multiple side beams in an umbrella configuration to be used in multi-beam holography. With a circular polarized beam incident to silicon wafer reflecting surfaces at the Brewster angle, multiple linearly s-polarized side beams are generated. 3D photonic crystal structures of woodpile, Penrose quasi-crystal, and hexagonal symmetry were produced with ROEs that have 4+1, 5+1 and 6+1 beam configurations, respectively. Since the ROE design can be readily changed and implemented for different photonic crystal structures, this fabrication method is more versatile and cost effective than currently comparable single optical methods like prisms and phase masks.

Paper Details

Date Published: 4 March 2015
PDF: 9 pages
Proc. SPIE 9350, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XX, 93501K (4 March 2015); doi: 10.1117/12.2079938
Show Author Affiliations
D. George, Univ. of North Texas (United States)
J. Lutkenhaus, Univ. of North Texas (United States)
D. Lowell, Univ. of North Texas (United States)
U. Philipose, Univ. of North Texas (United States)
H. Zhang, Univ. of North Texas (United States)
Z. Poole, Univ. of Pittsburgh (United States)
K. Chen, Univ. of Pittsburgh (United States)
Y. Lin, Univ. of North Texas (United States)


Published in SPIE Proceedings Vol. 9350:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XX
Stephan Roth; Yoshiki Nakata; Beat Neuenschwander; Xianfan Xu, Editor(s)

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