GaSb thermophotovoltaic cells fabricated using Molecular Beam Epitaxy (MBE) and ion implantation techniques are studied. Challenges including different defect formation mechanisms using MBE and ion-induced defects using ion implantation were investigated by cross-sectional Transmission Electron Microscopy (XTEM), X-Ray Diffraction spectroscopy (XRD) and Scanning Electron Microscopy (SEM). For MBE grown TPVs, several approaches were used to suppress defects, including substrate preparation and using different MBE reactors. For ion-implanted TPVs, different implant doses and energies were tested to minimize the crystal damage and various Rapid Thermal Anneal (RTA) process recipes were studied to maximize the crystal recovery. Large area TPV cells with 1 × 1 cm dimensions were fabricated using these techniques, then electrically and optically characterized. Ideality factors and dark saturation currents were measured and compared for various TPVs.

Date Published: 16 March 2015
PDF: 10 pages
Proc. SPIE 9358, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IV, 935816 (16 March 2015); doi: 10.1117/12.2079635

Published in SPIE Proceedings Vol. 9358:
Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IV
Alexandre Freundlich; Jean-François Guillemoles; Masakazu Sugiyama, Editor(s)