Proceedings Paper
Electron beam written subwavelength gratings for polarization separation in the infrared| Format | Member Price | Non-Member Price |
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Paper Abstract
The design and fabrication of transmission subwavelength binary gratings for operation as polarizing beam splitters
(PBSs) at 1550 nm is presented in this paper. An analytical method called the modal method was used for the design as
well as to predict the efficiencies of the polarization components in each order. Electron beam lithography has been
employed to fabricate the subwavelength grating structures on poly methyl methacrylate (PMMA). The performance of
the fabricated PBS has been evaluated by optical testing.
Paper Details
Date Published: 13 March 2015
PDF: 7 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937412 (13 March 2015); doi: 10.1117/12.2078607
Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)
PDF: 7 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937412 (13 March 2015); doi: 10.1117/12.2078607
Show Author Affiliations
V. Pramitha, Indian Institute of Technology Madras (India)
M. S. Gayathri, Indian Institute of Technology Madras (India)
M. S. Gayathri, Indian Institute of Technology Madras (India)
Shanti Bhattacharya, Indian Institute of Technology Madras (India)
Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)
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