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Proceedings Paper

High performance light trapping structures for Si-based photoelectronics fabricated by hybrid picosecond laser irradiation and chemical corrosion
Author(s): Lingfei Ji; Xiaozhan Lv; Yan Wu; Zhenyuan Lin; Yijian Jiang
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Paper Abstract

We propose the fabrication of two types high performance texturized antireflective structures on crystalline (100) silicon (c-Si) surface by hybrid picosecond laser scanning irradiation followed by chemical corrosion. The design and the fabrication with high controllable performance were studied. The hybrid method includes 1064 nm picosecond (ps) laser scanning to form micro-hole array and subsequently short-time alkaline corrosion. After ps laser processing, there is little reconsolidation and heat affect zone on the silicon surface, which is beneficial to achieve the precise chemical corrosion effect. Depending on the laser scanning intervals, scanning times and chemical corrosion time, a variety of surface texture morphologies, even a special micro-nano hierarchical structure in which finer nano-structures formed in the micro units of the texture, were achieved. Observing with SEM, the average diameter of the micro-holes in the micro-nano hierarchica is 25~30 μm, while the average size of the nano-level ladder-like structures on the micro-hole wall is from dozens to hundreds of nanometers. Comparing to the traditional laser texturing techniques for c-Si solar cell, the whole laser processing was carried out in an open air ambient without using etch mask and SF6/O2 plasma. The results show the reflectance value of the fabricated c-Si surfaces can reach as low as 6% (400 nm~1000 nm). This is a potential method for economical antireflective structures fabrication which is ideal for using in the high-efficiency silicon-based photoelectronic devices.

Paper Details

Date Published: 12 March 2015
PDF: 10 pages
Proc. SPIE 9351, Laser-based Micro- and Nanoprocessing IX, 93511R (12 March 2015); doi: 10.1117/12.2077959
Show Author Affiliations
Lingfei Ji, Beijing Univ. of Technology (China)
Xiaozhan Lv, Beijing Univ. of Technology (China)
Yan Wu, Beijing Univ. of Technology (China)
Zhenyuan Lin, Beijing Univ. of Technology (China)
Yijian Jiang, Beijing Univ. of Technology (China)

Published in SPIE Proceedings Vol. 9351:
Laser-based Micro- and Nanoprocessing IX
Udo Klotzbach; Kunihiko Washio; Craig B. Arnold, Editor(s)

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