
Proceedings Paper
Monte Carlo simulations applying rigorous coupled-wave analysis for tolerance analysis of diffractive optical elementsFormat | Member Price | Non-Member Price |
---|---|---|
$17.00 | $21.00 |
Paper Abstract
Rigorous coupled-wave analysis (RCWA) has been used for determining periodic grating structures of diffractive optical
elements (DOE) such as rectangular surface-relief gratings. When we observed a cross-sectional image of a
manufactured rectangular grating by the scanning transmission electron spectroscopy (STEM), we found that the
rectangular structure was deformed to a trapezoidal shape with non-zero corner radii. Therefore, we assumed that we
could derive more accurate diffraction efficiencies by RCWA using parameters of the trapezoid such as the height, base
angles, and the corner radii as well as the grating pitch. However, each parameter varies in distribution, resulting in a
variation in diffraction efficiencies. Tolerance analysis in the design stage is effective in quantitatively predicting that the
diffraction efficiencies are in the allowable ranges. Therefore, we have developed a Monte Carlo simulation program by
applying RCWA, which can handle distributions of these trapezoid parameters. The program can also handle the
distributions of the thickness and refractive indices of the thin films deposited on the grating. The distributions of the
trapezoid parameters were obtained through multiple measurements of the substrates without thin films using atomic
force microscopy. The distribution of the thickness and refractive indices of the thin films were obtained from analyzed
data measured in the vacuum deposition equipment. According to our measurements of the diffraction efficiencies of the
manufactured gratings, the diffraction efficiencies have been in the allowable range, and have also been consistent with
the Monte Carlo simulations for the tolerance analysis.
Paper Details
Date Published: 13 March 2015
PDF: 9 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 93741A (13 March 2015); doi: 10.1117/12.2077898
Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)
PDF: 9 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 93741A (13 March 2015); doi: 10.1117/12.2077898
Show Author Affiliations
Toru Inomata, Nalux Co., Ltd. (Japan)
Kayoko Fujimura, Nalux Co., Ltd. (Japan)
Masato Okano, Nalux Co., Ltd. (Japan)
Kazuya Yamamoto, Nalux Co., Ltd. (Japan)
Kayoko Fujimura, Nalux Co., Ltd. (Japan)
Masato Okano, Nalux Co., Ltd. (Japan)
Kazuya Yamamoto, Nalux Co., Ltd. (Japan)
Takeshi Yamamoto, Nalux Co., Ltd. (Japan)
Hitoshi Kimura, Nalux Co., Ltd. (Japan)
Tomohiro Kanakugi, Nalux Co., Ltd. (Japan)
Seiichiro Kitagawa, Nalux Co., Ltd. (Japan)
Hitoshi Kimura, Nalux Co., Ltd. (Japan)
Tomohiro Kanakugi, Nalux Co., Ltd. (Japan)
Seiichiro Kitagawa, Nalux Co., Ltd. (Japan)
Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)
© SPIE. Terms of Use
