
Proceedings Paper
Fully CMOS analog and digital SiPMsFormat | Member Price | Non-Member Price |
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Paper Abstract
Silicon Photomultipliers (SiPMs) are emerging single photon detectors used in many applications requiring large active
area, photon-number resolving capability and immunity to magnetic fields. We present three families of analog SiPM
fabricated in a reliable and cost-effective fully standard planar CMOS technology with a total photosensitive area of 1×1
mm2. These three families have different active areas with fill-factors (21%, 58.3%, 73.7%) comparable to those of
commercial SiPM, which are developed in vertical (current flow) custom technologies. The peak photon detection
efficiency in the near-UV tops at 38% (fill-factor included) comparable to commercial custom-process ones and dark
count rate density is just a little higher than the best-in-class commercial analog SiPMs. Thanks to the CMOS processing,
these new SiPMs can be integrated together with active components and electronics both within the microcell and on-chip,
in order to act at the microcell level or to perform global pre-processing. We also report CMOS digital SiPMs in
the same standard CMOS technology, based on microcells with digitalized processing, all integrated on-chip. This
CMOS digital SiPMs has four 32×1 cells (128 microcells), each consisting of SPAD, active quenching circuit with
adjustable dead time, digital control (to switch off noisy SPADs and readout position of detected photons), and fast
trigger output signal. The achieved 20% fill-factor is still very good.
Paper Details
Date Published: 17 April 2015
PDF: 6 pages
Proc. SPIE 9359, Optical Components and Materials XII, 93591B (17 April 2015); doi: 10.1117/12.2077473
Published in SPIE Proceedings Vol. 9359:
Optical Components and Materials XII
Shibin Jiang; Michel J. F. Digonnet, Editor(s)
PDF: 6 pages
Proc. SPIE 9359, Optical Components and Materials XII, 93591B (17 April 2015); doi: 10.1117/12.2077473
Show Author Affiliations
Yu Zou, Politecnico di Milano (Italy)
Federica Villa, Politecnico di Milano (Italy)
Danilo Bronzi, Politecnico di Milano (Italy)
Federica Villa, Politecnico di Milano (Italy)
Danilo Bronzi, Politecnico di Milano (Italy)
Simone Tisa, Micro Photon Devices S.r.l. (Italy)
Alberto Tosi, Politecnico di Milano (Italy)
Franco Zappa, Politecnico di Milano (Italy)
Micron Photon Device S.r.l. (Italy)
Alberto Tosi, Politecnico di Milano (Italy)
Franco Zappa, Politecnico di Milano (Italy)
Micron Photon Device S.r.l. (Italy)
Published in SPIE Proceedings Vol. 9359:
Optical Components and Materials XII
Shibin Jiang; Michel J. F. Digonnet, Editor(s)
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