Share Email Print

Proceedings Paper

Application of finite difference to study morphology evolution during etching the optical surface with subsurface damage
Author(s): Hairong Wang; Lihui Xiao; Hongfeng Chen; Zhuangde Jiang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

One important approach to characterize full three-dimensional information is to simulate the etching process of a sample with subsurface damage reversely. The simulation starts from the morphology of the sample at a certain time when the subsurface damage can be opened totally. In the etching experiment, it is possible for us to get the surface morphology at any time. The paper presents a finite difference algorithm to simulate the morphology evolution in an etching process and by the finite difference algorithm the morphology of the sample at a specific time can be given. Comparison of the simulated morphology and measured one provides us the clue of improving the finite difference algorithm. In this paper, the accuracy can be calculated through comparing the simulation with experimental result, and the maximum error of subsurface damage will be calculated.

Paper Details

Date Published: 19 February 2015
PDF: 7 pages
Proc. SPIE 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014), 94493L (19 February 2015); doi: 10.1117/12.2075632
Show Author Affiliations
Hairong Wang, Xi'an Jiaotong Univ. (China)
Lihui Xiao, Xi'an Jiaotong Univ. (China)
Hongfeng Chen, Xi'an Jiaotong Univ. (China)
Zhuangde Jiang, Xi'an Jiaotong Univ. (China)

Published in SPIE Proceedings Vol. 9449:
The International Conference on Photonics and Optical Engineering (icPOE 2014)
Ailing Tian; Anand Asundi; Weiguo Liu; Chunmin Zhang, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?