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Proceedings Paper

Photomask CD and LER characterization using Mueller matrix spectroscopic ellipsometry
Author(s): A. Heinrich; I. Dirnstorfer; J. Bischoff; K. Meiner; H. Ketelsen; U. Richter; T. Mikolajick
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Paper Abstract

Critical dimension and line edge roughness on photomask arrays are determined with Mueller matrix spectroscopic ellipsometry. Arrays with large sinusoidal perturbations are measured for different azimuth angels and compared with simulations based on rigorous coupled wave analysis. Experiment and simulation show that line edge roughness leads to characteristic changes in the different Mueller matrix elements. The influence of line edge roughness is interpreted as an increase of isotropic character of the sample. The changes in the Mueller matrix elements are very similar when the arrays are statistically perturbed with rms roughness values in the nanometer range suggesting that the results on the sinusoidal test structures are also relevant for “real” mask errors. Critical dimension errors and line edge roughness have similar impact on the SE MM measurement. To distinguish between both deviations, a strategy based on the calculation of sensitivities and correlation coefficients for all Mueller matrix elements is shown. The Mueller matrix elements M13/M31 and M34/M43 are the most suitable elements due to their high sensitivities to critical dimension errors and line edge roughness and, at the same time, to a low correlation coefficient between both influences. From the simulated sensitivities, it is estimated that the measurement accuracy has to be in the order of 0.01 and 0.001 for the detection of 1 nm critical dimension error and 1 nm line edge roughness, respectively.

Paper Details

Date Published: 17 October 2014
PDF: 14 pages
Proc. SPIE 9231, 30th European Mask and Lithography Conference, 92310L (17 October 2014); doi: 10.1117/12.2065670
Show Author Affiliations
A. Heinrich, NaMLab gGmbH (Germany)
I. Dirnstorfer, NaMLab gGmbH (Germany)
J. Bischoff, Osires (Germany)
K. Meiner, Sentech Instruments GmbH (Germany)
H. Ketelsen, Sentech Instruments GmbH (Germany)
U. Richter, Sentech Instruments GmbH (Germany)
T. Mikolajick, NaMLab gGmbH (Germany)
Technische Univ. Dresden (Germany)

Published in SPIE Proceedings Vol. 9231:
30th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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