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Proceedings Paper

Design consideration for nano-accuracy long trace profiler at BSRF
Author(s): Fugui Yang; Lichao Wang; Shanzhi Tang; Qiushi Wang; Ming Li
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Paper Abstract

The third generation synchrotron radiation source like High Energy Photon Source (HEPS, Beijing) requires X-ray optics surface with high accuracy. It is crucial to develop advanced optics surface metrology instrument. The Long Trace Profiler (LTP) is an instrument which measures slope in the long dimension of an optical surface. In order to meet the accuracy requirements for synchrotron optics, a number of researches have been carried out to improve the LTP during the last decades. Many variations have been installed worldwide. As a part of the advanced research of HEPS, the metrology laboratory at Beijing Synchrotron Radiation Facility (BSRF, Beijing) has been conducting work of building a new LTP since 2012. The accuracy of the instrument is expected to be <0.1μrad rms for component up to 1m in length. In this paper, we present some design consideration for nano-accuracy LTP. Two error sources, including the deformation of the granite structure and imperfect optical surface, are studied. We report our optimized configuration of the granite structure and the dependences of the measurement error on the surface error. The results are considered as an important instruction for the proper choice of each component in the profiler. We expect to bring the profiler into operation in 2015.

Paper Details

Date Published: 17 September 2014
PDF: 8 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920606 (17 September 2014); doi: 10.1117/12.2065327
Show Author Affiliations
Fugui Yang, Institute of High Energy Physics (China)
Lichao Wang, Institute of High Energy Physics (China)
Shanzhi Tang, Institute of High Energy Physics (China)
Qiushi Wang, Institute of High Energy Physics (China)
Ming Li, Institute of High Energy Physics (China)

Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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