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Proceedings Paper

Built-in lens mask lithography: challenge for high definition lens-less lithography
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Paper Abstract

Novel photo-lithography is newly proposed named built-in lens mask lithography. The method emulates optical propagation plane in exposure system using binary transmittance and phase mask instead of projection lens. The performance of the built-in lens mask lithography is studied by numerical simulation and experimental study using conventional proximity exposure system. The result shows resolution enhancement in deep focus plane.

Paper Details

Date Published: 28 July 2014
PDF: 8 pages
Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560A (28 July 2014); doi: 10.1117/12.2065251
Show Author Affiliations
Naoki Ueda, Osaka Prefecture Univ. (Japan)
Masaru Sasago, Osaka Prefecture Univ. (Japan)
Akio Misaka, Osaka Prefecture Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)
Hiroaki Kawata, Osaka Prefecture Univ. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)

Published in SPIE Proceedings Vol. 9256:
Photomask and Next-Generation Lithography Mask Technology XXI
Kokoro Kato, Editor(s)

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