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Proceedings Paper

Photoinhibited superresolution lithography: overcoming chemical blur
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Paper Abstract

Photoinhibited superressolution (PInSR) lithography is a two--color, one-photon scheme that promises high throughput far-field patterning t deep subwwabvelength scales. Previous work ha shown that the technique susceptible to blurring from active species diffusion, an issue which we have recently overcome with the use of a low-diffiusivity methrylate resist. Here we present out first clear demonstration of superresolution, showing feature spacing 3X better than the 0.2 NA diffraction limit.

Paper Details

Date Published: 28 March 2014
PDF: 8 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491W (28 March 2014); doi: 10.1117/12.2063254
Show Author Affiliations
Darren L. Forman, Univ. of Colorado at Boulder (United States)
Robert R. McLeod, Univ. of Colorado at Boulder (United States)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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