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Proceedings Paper

Ultra-high-precision surface processing techniques for nanofocusing ellipsoidal mirrors in hard x-ray region
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Paper Abstract

X-ray microscopic analysis as a fundamental tool in various scientific fields is supported by advancements in highprecision x-ray optics. Off-axis ellipsoidal focusing mirror optics, which can produce two-dimensional focus with a mirror and has characteristics of high reflectivity and achromaticity, is quite attractive for use in microscopic analysis. However, technical problems in fabrication prevent a realization of off-axis ellipsoidal mirrors with nanometer accuracy for nano-focusing of hard x-rays. The purpose of this study was to resolve a problem of surface processing technique for fabrication of nanofocusing ellipsoidal mirrors in the hard x-ray region. We developed two types of ultra-high-precision surface processing machines by advancing the Elastic Emission Machining method. One is a machine for improvement of surface roughness with a rotary type working head, and the other is a machine for a computer-controlled figure correction with a small-aperture nozzle type working head. Using the rotary type machine, we confirmed that surface roughness of 4.32 nm root-mean-square (RMS) on an off-axis ellipsoidal mirror surface was improved to 0.14 nm (RMS) within a spatial wavelength range of shorter than several hundred microns. Using the nozzle type machine, we demonstrated a figure correction in a spatial wavelength of longer than 100 μm with nanometer height accuracy. Ultrahigh- precision surface processing technologies with the capability of fabricating nano-focusing off-axis ellipsoidal mirrors were established.

Paper Details

Date Published: 5 September 2014
PDF: 11 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920605 (5 September 2014); doi: 10.1117/12.2063146
Show Author Affiliations
Hirokatsu Yumoto, Japan Synchrotron Radiation Research Institute (Japan)
RIKEN (Japan)
Takahisa Koyama, Japan Synchrotron Radiation Research Institute (Japan)
RIKEN (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Haruhiko Ohashi, Japan Synchrotron Radiation Research Institute (Japan)
RIKEN (Japan)

Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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