X-ray microscopic analysis as a fundamental tool in various scientific fields is supported by advancements in highprecision x-ray optics. Off-axis ellipsoidal focusing mirror optics, which can produce two-dimensional focus with a mirror and has characteristics of high reflectivity and achromaticity, is quite attractive for use in microscopic analysis. However, technical problems in fabrication prevent a realization of off-axis ellipsoidal mirrors with nanometer accuracy for nano-focusing of hard x-rays. The purpose of this study was to resolve a problem of surface processing technique for fabrication of nanofocusing ellipsoidal mirrors in the hard x-ray region. We developed two types of ultra-high-precision surface processing machines by advancing the Elastic Emission Machining method. One is a machine for improvement of surface roughness with a rotary type working head, and the other is a machine for a computer-controlled figure correction with a small-aperture nozzle type working head. Using the rotary type machine, we confirmed that surface roughness of 4.32 nm root-mean-square (RMS) on an off-axis ellipsoidal mirror surface was improved to 0.14 nm (RMS) within a spatial wavelength range of shorter than several hundred microns. Using the nozzle type machine, we demonstrated a figure correction in a spatial wavelength of longer than 100 μm with nanometer height accuracy. Ultrahigh- precision surface processing technologies with the capability of fabricating nano-focusing off-axis ellipsoidal mirrors were established.

Date Published: 5 September 2014
PDF: 11 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920605 (5 September 2014); doi: 10.1117/12.2063146

Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)