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Proceedings Paper

Polarization measurement of free electron laser pulses in the VUV generated by the variable polarization source FERMI
Author(s): P. Finetti; E. Allaria; B. Diviacco; C. Callegari; B. Mahieu; J. Viefhaus; M. Zangrando; G. De Ninno; G. Lambert; E. Ferrari; J. Buck; M. Ilchen; B. Vodungbo; N. Mahne; C. Svetina; C. Spezzani; S. Di Mitri; G. Penco; M. Trovò; W. M. Fawley; P. Rebernik; D. Gauthier; C. Grazioli; M. Coreno; B. Ressel; A. Kivimäki; T. Mazza; L. Glaser; F. Scholz; J. Seltmann; P. Gessler; J. Grünert; A. De Fanis; M. Meyer; A. Knie; S. P. Moeller; L. Raimondi; F. Capotondi; E. Pedersoli; O. Plekan; M. Danailov; A. Demidovich; I. Nikolov; A. Abrami; J. Gautier; J. Lüning; P. Zeitoun; L. Giannessi
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Paper Abstract
FERMI, based at Elettra (Trieste, Italy) is the first free electron laser (FEL) facility operated for user experiments in seeded mode. Another unique property of FERMI, among other FEL sources, is to allow control of the polarization state of the radiation. Polarization dependence in the study of the interaction of coherent, high field, short-pulse ionizing radiation with matter, is a new frontier with potential in a wide range of research areas. The first measurement of the polarization-state of VUV light from a single-pass FEL was performed at FERMI FEL-1 operated in the 52 nm-26 nm range. Three different experimental techniques were used. The experiments were carried out at the end-station of two different beamlines to assess the impact of transport optics and provide polarization data for the end user. In this paper we summarize the results obtained from different setups. The results are consistent with each other and allow a general discussion about the viability of permanent diagnostics aimed at monitoring the polarization of FEL pulses.
Paper Details
Date Published: 8 October 2014
PDF: 12 pages
Proc. SPIE 9210, X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications II, 92100K (8 October 2014); doi: 10.1117/12.2062717
Show Author Affiliations
P. Finetti, Sincrotrone Trieste S.C.p.A. (Italy)
E. Allaria, Sincrotrone Trieste S.C.p.A. (Italy)
B. Diviacco, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
C. Callegari, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
B. Mahieu, Ecole Nationale Supérieure de Techniques Avancées, CNRS (France)
J. Viefhaus, Deutsches Elektronen-Synchrotron (Germany)
M. Zangrando, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Istituto Officina dei Materiali, CNR (Italy)
G. De Ninno, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Univ. of Nova Gorica (Slovenia)
G. Lambert, Ecole Nationale Supérieure de Techniques Avancées, CNRS (France)
E. Ferrari, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Univ. degli Studi di Trieste (Italy)
J. Buck, European XFEL GmbH (Germany)
M. Ilchen, European XFEL GmbH (Germany)
Stanford PULSE Institute (United States)
B. Vodungbo, Sorbonne Univ. (France)
LCPMR, CNRS (France)
N. Mahne, Sincrotrone Trieste S.C.p.A. (Italy)
C. Svetina, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Univ. degli Studi di Trieste (Italy)
C. Spezzani, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
S. Di Mitri, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
G. Penco, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
M. Trovò, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
W. M. Fawley, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
P. Rebernik, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Univ. of Nova Gorica (Slovenia)
D. Gauthier, Sincrotrone Trieste S.C.p.A. (Italy)
Univ. of Nova Gorica (Slovenia)
C. Grazioli, Univ. of Nova Gorica (Slovenia)
Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Istituto Officina dei Materiali, CNR (Italy)
M. Coreno, Sincrotrone Trieste S.C.p.A. (Italy)
CNR-ISM (Italy)
B. Ressel, Univ. of Nova Gorica (Slovenia)
A. Kivimäki, Istituto Officina dei Materiali, CNR (Italy)
T. Mazza, European XFEL GmbH (Germany)
L. Glaser, Deutsches Elektronen-Synchrotron (Germany)
F. Scholz, Deutsches Elektronen-Synchrotron (Germany)
J. Seltmann, Deutsches Elektronen-Synchrotron (Germany)
P. Gessler, European XFEL GmbH (Germany)
J. Grünert, European XFEL GmbH (Germany)
A. De Fanis, European XFEL GmbH (Germany)
M. Meyer, European XFEL GmbH (Germany)
A. Knie, Univ. Kassel (Germany)
S. P. Moeller, SLAC National Accelerator Lab. (United States)
L. Raimondi, Sincrotrone Trieste S.C.p.A. (Italy)
F. Capotondi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
E. Pedersoli, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
O. Plekan, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
M. Danailov, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
A. Demidovich, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
I. Nikolov, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
A. Abrami, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
J. Gautier, Ecole Nationale Supérieure de Techniques Avancées, CNRS (France)
J. Lüning, Sorbonne Univ. (France)
LCPMR, CNRS (France)
P. Zeitoun, Ecole Nationale Supérieure de Techniques Avancées, CNRS (France)
L. Giannessi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
ENEA (Italy)

Published in SPIE Proceedings Vol. 9210:
X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications II
Stefan P. Hau-Riege; Stefan P. Moeller; Makina Yabashi, Editor(s)
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