Share Email Print

Proceedings Paper

Kinoform lens focusing of high-energy x-rays (50 - 100 keV)
Author(s): S. D. Shastri; K. Evans-Lutterodt; R. L. Sheffield; A. Stein; M. Metzler; P. Kenesei
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

High-energy x-rays from a synchrotron source are well suited for numerous applications, such as studies of materials structure and stress in bulk or extreme environments. Some of these methods require high spatial resolution. Planar kinoforms are shown to focus monochromatized undulator radiation in the 50–100 keV range down to 0.2–1.5 μm beam sizes at 0.25–2 m focal distances. These lenses were fabricated by reactive ion etching of silicon. At such high x-ray energies, these optics can offer substantial transmission and lens aperture.

Paper Details

Date Published: 17 September 2014
PDF: 9 pages
Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 920704 (17 September 2014); doi: 10.1117/12.2062635
Show Author Affiliations
S. D. Shastri, Argonne National Lab. (United States)
K. Evans-Lutterodt, Brookhaven National Lab. (United States)
R. L. Sheffield, Los Alamos National Lab. (United States)
A. Stein, Brookhaven National Lab. (United States)
M. Metzler, Cornell Univ. (United States)
P. Kenesei, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 9207:
Advances in X-Ray/EUV Optics and Components IX
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?