Share Email Print

Proceedings Paper

Plasma formation during excimer laser irradiation of thin selenium films in air
Author(s): Alain Jadin; Igor V. Filiouguine; Michel Wautelet; Lucien Diego Laude
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Thin selenium films are irradiated in air by means of an excimer laser beam (wavelength 248 nm). The fluence threshold for plasma formation is measured as a function of the thickness of the film (20 to 230 nm) and the nature of the substrate (glass, quartz, sapphire). The fluence threshold, F(2), varies in the range 0.5-3.5 J.cm2. At low fluences, films are totally ablated after a certain number of pulses. This number decreases with increasing fluence, independently of the initial thickness of the film. Experimental results are compared with numerical simulation of temperature where the role of the film thickness and the nature of the substrate are introduced.

Paper Details

Date Published: 1 August 1990
PDF: 6 pages
Proc. SPIE 1279, Laser-Assisted Processing II, (1 August 1990); doi: 10.1117/12.20626
Show Author Affiliations
Alain Jadin, Univ. de Mons-Hainaut (Belgium)
Igor V. Filiouguine, Univ. de Mons-Hainaut (Belgium)
Michel Wautelet, Univ. de Mons-Hainaut (Belgium)
Lucien Diego Laude, Univ. de Mons-Hainaut (Belgium)

Published in SPIE Proceedings Vol. 1279:
Laser-Assisted Processing II
Lucien Diego Laude, Editor(s)

© SPIE. Terms of Use
Back to Top