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Proceedings Paper

Excimer-laser-beam-scanning chemical vapor deposition of ultrathin multilayer films for soft x-ray mirrors
Author(s): Katsuhiko Mutoh; Yuka Yamada; Shigeru Takeyama; Takeo Miyata
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Paper Abstract

The authors describe a newly developed laser-induced chemical vapor deposition (LCVD) process using an argon-fluoride excimer laser. The LCVD apparatus is equipped with an ultrahigh-vacuum chamber system including an Auger electron spectroscopy (AES) analysis chamber and a focused laser-beam scanning system. Hydrogenated amorphous silicon films free from oxygen contamination are confirmed to be fabricated using the AES analysis before exposing the films to air. Silicon film oxidation process after prolonged exposure to air is also characterized using the AES analysis. Furthermore, the new LCVD process is applied to the fabrication of soft x-ray multilayer mirrors. A tungsten-silicon multilayer mirror with a laterally varying film thickness for high performance soft x-ray focusing systems is successfully obtained on the design rule.

Paper Details

Date Published: 10 April 1995
PDF: 10 pages
Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); doi: 10.1117/12.206258
Show Author Affiliations
Katsuhiko Mutoh, Matsushita Research Institute Tokyo, Inc. (Japan)
Yuka Yamada, Matsushita Research Institute Tokyo, Inc. (Japan)
Shigeru Takeyama, Matsushita Research Institute Tokyo, Inc. (Japan)
Takeo Miyata, Matsushita Research Institute Tokyo, Inc. (Japan)

Published in SPIE Proceedings Vol. 2403:
Laser-Induced Thin Film Processing
Jan J. Dubowski, Editor(s)

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