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Proceedings Paper

APS deposition facility upgrades and future plans
Author(s): Ray Conley Jr.; Bing Shi; Mark Erdmann; Scott Izzo; Lahsen Assoufid; Kurt Goetze; Tim Mooney; Kenneth Lauer
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Paper Abstract

The Advanced Photon Source (APS) has recently invested resources to upgrade or replace aging deposition systems with modern equipment. Of the three existing deposition systems, one will receive an upgrade, while two are being replaced. A design which adds a three-substrate planetary for the APS rotary deposition system is almost complete. The replacement for the APS large deposition system, dubbed the “Modular Deposition System”, has been conceptually designed and is in the procurement process. Eight cathodes will sputter horizontally on mirrors up to 1.5 meters in length. This new instrument is designed to interface with ion-milling instruments and various metrology equipment for ion-beam figuring. A third linear machine, called the APS Profile Coating System, has two cathodes and is designed to accept substrates up to 200mm in length. While this machine is primarily intended for fabrication of figured KB mirrors using the profile-coating technique, it has also been used to produce multilayer monochromators for beamline use.

Paper Details

Date Published: 5 September 2014
PDF: 6 pages
Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 92070I (5 September 2014); doi: 10.1117/12.2062427
Show Author Affiliations
Ray Conley Jr., Argonne National Lab. (United States)
Bing Shi, Argonne National Lab. (United States)
Mark Erdmann, Argonne National Lab. (United States)
Scott Izzo, Argonne National Lab. (United States)
Lahsen Assoufid, Argonne National Lab. (United States)
Kurt Goetze, Argonne National Lab. (United States)
Tim Mooney, Argonne National Lab. (United States)
Kenneth Lauer, Brookhaven National Lab. (United States)

Published in SPIE Proceedings Vol. 9207:
Advances in X-Ray/EUV Optics and Components IX
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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