Share Email Print

Proceedings Paper

A new x-ray optics laboratory (XROL) at the ALS: mission, arrangement, metrology capabilities, performance, and future plans
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The X-Ray Optics Laboratory (XROL) at the Advanced Light Source (ALS), a unique optical metrology lab, has been recently moved to a new, dedicated clean-room facility that provides improved environmental and instrumental conditions vitally required for high accuracy metrology with state-of-the-art X-ray optics. Besides the ALS, the XROL serves several DOE labs that lack dedicated on-site optical metrology capabilities, including the Linac Coherent Light Source (LCLS) at SLAC and LBNL’s Center for X-Ray Optics (CXRO). The major role of XROL is to proactively support the development and optimal beamline use of x-ray optics. The application of different instruments available in the lab enables separate, often complementary, investigations and addresses of different potential sources of error affecting beamline performance. At the beamline, all the perturbations combine to produce a cumulative effect on the performance of the optic that makes it difficult to optimize the optic's operational performance. Ex situ metrology allows us to address the majority of the problems before the installation of the optic at a beamline, and to provide feedback on design and guidelines for the best usage of optics. We will review the ALS XROL mission, lab design and arrangement, ex situ metrology capabilities and performance, as well as the future plans for instrumentation upgrades. The discussion will be illustrated with the results of a broad spectrum of measurements of x-ray optics and optical systems performed at the XROL.

Paper Details

Date Published: 17 September 2014
PDF: 19 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 92060I (17 September 2014); doi: 10.1117/12.2062042
Show Author Affiliations
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Nikolay A. Artemiev, Lawrence Berkeley National Lab. (United States)
Ian Lacey, Lawrence Berkeley National Lab. (United States)
Wayne R. McKinney, Lawrence Berkeley National Lab. (United States)
Howard A. Padmore, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?