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Proceedings Paper

Wavefront propagation simulations for a UV/soft x-ray beamline: Electron Spectro-Microscopy beamline at NSLS-II
Author(s): N. Canestrari; V. Bisogni; A. Walter; Y. Zhu; J. Dvorak; E. Vescovo; O. Chubar
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Paper Abstract

A “source-to-sample” wavefront propagation analysis of the Electron Spectro-Microscopy (ESM) UV / soft X-ray beamline, which is under construction at the National Synchrotron Light Source II (NSLS-II) in the Brookhaven National Laboratory, has been conducted. All elements of the beamline - insertion device, mirrors, variable-line-spacing gratings and slits - are included in the simulations. Radiation intensity distributions at the sample position are displayed for representative photon energies in the UV range (20 - 100 eV) where diffraction effects are strong. The finite acceptance of the refocusing mirrors is the dominating factor limiting the spatial resolution at the sample (by ~3 μm at 20 eV). Absolute estimates of the radiation flux and energy resolution at the sample are also obtained from the electromagnetic calculations. The analysis of the propagated UV range undulator radiation at different deflection parameter values demonstrates that within the beamline angular acceptance a slightly “red-shifted” radiation provides higher flux at the sample and better energy resolution compared to the on-axis resonant radiation of the fundamental harmonic.

Paper Details

Date Published: 5 September 2014
PDF: 9 pages
Proc. SPIE 9209, Advances in Computational Methods for X-Ray Optics III, 92090I (5 September 2014); doi: 10.1117/12.2061979
Show Author Affiliations
N. Canestrari, Brookhaven National Lab. (United States)
V. Bisogni, Brookhaven National Lab. (United States)
A. Walter, Brookhaven National Lab. (United States)
Y. Zhu, Brookhaven National Lab. (United States)
J. Dvorak, Brookhaven National Lab. (United States)
E. Vescovo, Brookhaven National Lab. (United States)
O. Chubar, Brookhaven National Lab. (United States)

Published in SPIE Proceedings Vol. 9209:
Advances in Computational Methods for X-Ray Optics III
Manuel Sanchez del Rio; Oleg Chubar, Editor(s)

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