
Proceedings Paper
A reflectometer for at-wavelength characterization of XUV-reflection gratingsFormat | Member Price | Non-Member Price |
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$17.00 | $21.00 |
Paper Abstract
Within our technology center for production of highly efficient precision gratings a versatile 4-circle UHV-reflectometer
for synchrotron radiation based at-wavelength characterization has been fabricated. The main feature is the possibility to
incorporate real live-sized gratings. The samples are adjustable within six degrees of freedom by a novel UHV-tripod
system, and the reflectivity can be measured at all incidence angles for both s- and p-polarization geometry. The
reflectometer has been setup in a clean room hutch and it is coupled permanently to the optics beamline PM-1 for the UV
and XUV range with the polarization adjustable to either linear or elliptical. The setup will be open to users by the end of
2014.
Paper Details
Date Published: 5 September 2014
PDF: 12 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920607 (5 September 2014); doi: 10.1117/12.2061828
Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
PDF: 12 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920607 (5 September 2014); doi: 10.1117/12.2061828
Show Author Affiliations
F. Eggenstein, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
P. Bischoff, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Gaupp, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Senf, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
P. Bischoff, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Gaupp, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Senf, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Sokolov, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Schäfers, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Schäfers, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
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