
Proceedings Paper
An XUV optics beamline at BESSY IIFormat | Member Price | Non-Member Price |
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$17.00 | $21.00 |
Paper Abstract
The design for a new XUV-Optics Beamline is presented. The collimated plane grating monochromator (PGM-)
beamline at a bending magnet is setup at the BESSY-II synchrotron radiation facility within the framework of the
blazed-grating production facility. Coupled to a versatile four-circle (ten axes) UHV- reflectometer as a permanent end
station the whole setup is dedicated to at-wavelength characterization and calibration of the in-house produced precision
gratings and novel nano-optical devices as well as mirrors, multilayered systems etc. It is also open to external projects
employing reflectometry, spectroscopy or scattering techniques. According to its purpose, this beamline has specific
features, such as: very high spectral purity, provided by two independent high order suppression systems, an advanced
aperture system for suppression of stray light and scattered radiation, a broad energy range between 10 eV and 2000 eV,
small beam divergence and spot size on the sample. Thus this Optics Beamline will become a powerful metrology tool
for reflectivity measurements in s- or p-polarisation geometry with linearly or elliptically polarized light on real optics up
to 360 mm length and 4 kg weight.
Paper Details
Date Published: 5 September 2014
PDF: 13 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 92060J (5 September 2014); doi: 10.1117/12.2061778
Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
PDF: 13 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 92060J (5 September 2014); doi: 10.1117/12.2061778
Show Author Affiliations
A. A. Sokolov, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Eggenstein, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Erko, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
R. Follath, Paul Scherrer Institute (Switzerland)
S. Künstner, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
M. Mast, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Eggenstein, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
A. Erko, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
R. Follath, Paul Scherrer Institute (Switzerland)
S. Künstner, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
M. Mast, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
J. S. Schmidt, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Senf, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Schäfers, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Senf, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Zeschke, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
F. Schäfers, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
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