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Proceedings Paper

A new optical head tracing reflected light for nanoprofiler
Author(s): K. Okuda; K. Okita; Y. Tokuta; T. Kitayama; M. Nakano; R. Kudo; K. Yamamura; K. Endo
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Paper Abstract

High accuracy optical elements are applied in various fields. For example, ultraprecise aspherical mirrors are necessary for developing third-generation synchrotron radiation and XFEL (X-ray Free Electron LASER) sources. In order to make such high accuracy optical elements, it is necessary to realize the measurement of aspherical mirrors with high accuracy. But there has been no measurement method which simultaneously achieves these demands yet. So, we develop the nanoprofiler that can directly measure the any surfaces figures with high accuracy. The nanoprofiler gets the normal vector and the coordinate of a measurement point with using LASER and the QPD (Quadrant Photo Diode) as a detector. And, from the normal vectors and their coordinates, the three-dimensional figure is calculated. In order to measure the figure, the nanoprofiler controls its five motion axis numerically to make the reflected light enter to the QPD’s center. The control is based on the sample's design formula. We measured a concave spherical mirror with a radius of curvature of 400 mm by the deflection method which calculates the figure error from QPD’s output, and compared the results with those using a Fizeau interferometer. The profile was consistent within the range of system error. The deflection method can’t neglect the error caused from the QPD’s spatial irregularity of sensitivity. In order to improve it, we have contrived the zero method which moves the QPD by the piezoelectric motion stage and calculates the figure error from the displacement.

Paper Details

Date Published: 5 September 2014
PDF: 9 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920602 (5 September 2014); doi: 10.1117/12.2061703
Show Author Affiliations
K. Okuda, Osaka Univ. (Japan)
K. Okita, Osaka Univ. (Japan)
Y. Tokuta, Osaka Univ. (Japan)
T. Kitayama, Osaka Univ. (Japan)
M. Nakano, Osaka Univ. (Japan)
R. Kudo, Osaka Univ. (Japan)
K. Yamamura, Osaka Univ. (Japan)
K. Endo, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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