
Proceedings Paper
Lightfast optical current in dielectric by plasmonically induced local fieldFormat | Member Price | Non-Member Price |
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Paper Abstract
Recently, ultrafast strong field induced optical current in SiO2 dielectric medium has demonstrated. By foaming laser
intensity more than 1013 W•cm-2 in the dielectric material, the optical current was generated in a dielectric gap without
any DC bias. This phenomenon is affected by the strength electric field of incident laser field and the generated electrons
follow the speed of optical frequency enabling lightfast electronics in the future. In this study, we especially adopted
nanoplasmonic field to trigger and control current flow in a nanometer spatial resolution. Nanoplasmonic field enables to
manipulate light field in nanoscale domain. By using nanoplasmonic field, optically induced current flow can be
selectively controlled by characteristic of nanoplasmonic nanostructure.
For the first demonstration, saw tooth like 2-D nano Au pattern was numerically and experimentally investigated to boost
up the laser intensity of incident 4.5 fs laser pulse with minimum field distortion and broadening. The intensity
enhancement factor of plasmonic field at the saw tooth tip was ~40, enabling Wannier–Stark effect with incidence
intensity level of only 1011W•cm-2 in the TiO2 substrate. The carrier envelope phase of laser pulse is controlled to
measure ultrafast optical current generation in dielectric medium by plasmonically induced strong near-field. This will be
the basis for developing practical lightfast optical electronics in the future.
Paper Details
Date Published: 28 August 2014
PDF: 6 pages
Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91701F (28 August 2014); doi: 10.1117/12.2061518
Published in SPIE Proceedings Vol. 9170:
Nanoengineering: Fabrication, Properties, Optics, and Devices XI
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)
PDF: 6 pages
Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91701F (28 August 2014); doi: 10.1117/12.2061518
Show Author Affiliations
Seungchul Kim, Pohang Univ. of Science and Technology (Korea, Republic of)
Max Planck Ctr. for Attosecond Science (Korea, Republic of)
Ojoon Kwon, Pohang Univ. of Science and Technology (Korea, Republic of)
Max Planck Ctr. for Attosecond Science (Korea, Republic of)
Max Planck Ctr. for Attosecond Science (Korea, Republic of)
Ojoon Kwon, Pohang Univ. of Science and Technology (Korea, Republic of)
Max Planck Ctr. for Attosecond Science (Korea, Republic of)
Tae-Woo Lee, KAIST (Korea, Republic of)
Published in SPIE Proceedings Vol. 9170:
Nanoengineering: Fabrication, Properties, Optics, and Devices XI
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)
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