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Proceedings Paper

Properties of Si/SiO2 superlattice nanodisc array prepared by nanosphere lithography
Author(s): Takaya Higa; Ryousuke Ishikawa; Shinsuke Miyajima; Makoto Konagai
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Paper Abstract

We fabricated nanostructured Si/SiO2 superlattice films for solar cell appliactions. The Si/SiO2 superlattice films were fabricated by thermal annealing of a-Si/SiO2 superlattice films. TEM observations revealed the existence of nanocrystalline Si in the Si layer. This sample showed photoluminescence spectrum with peak energy at around 1.5 eV. It was also found that the defect density in the superlattice was reduced by using forming gas annealing. Applying nanosphere lithography and reactive ion etching, we successfully prepared nanostructures on the surface of the superlattice. We also compared the optical properties with the simulation results using rigorous coupled wave analysis.

Paper Details

Date Published: 7 October 2014
PDF: 7 pages
Proc. SPIE 9178, Next Generation Technologies for Solar Energy Conversion V, 91780P (7 October 2014); doi: 10.1117/12.2061472
Show Author Affiliations
Takaya Higa, Tokyo Intitute Of Technology (Japan)
Ryousuke Ishikawa, Niigata Univ. (Japan)
Shinsuke Miyajima, Tokyo Institute of Technology (Japan)
Makoto Konagai, Tokyo Institute of Technology (Japan)
Japan Science and Technology Agency (Japan)

Published in SPIE Proceedings Vol. 9178:
Next Generation Technologies for Solar Energy Conversion V
Oleg V. Sulima; Gavin Conibeer, Editor(s)

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