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Proceedings Paper

The effect of the substrate temperature and the acceleration potential drop on the structural and physical properties of SiC thin films deposed by TVA method
Author(s): Victor Ciupina; Cristian P. Lungu; Rodica Vladoiu; Gabriel C. Prodan; Stefan Antohe; Corneliu Porosnicu; Iuliana Stanescu; Ionut Jepu; Sorina Iftimie; Madalina Prodan; Aurelia Mandes; Virginia Dinca; Eugeniu Vasile; Valeriu Zarovski; Virginia Nicolescu
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Paper Abstract

Crystalline Si-C thin films were prepared at substrate temperature between 200°C and 1000°C using Thermionic Vacuum Arc (TVA) method. To increase the acceleration potential drop a negative bias voltage up to -1000V was applied on the substrate. The 200nm thickness carbon thin films was deposed on glass and Si substrate and then 200-500 nm thickness Si-C layer on carbon thin films was deposed. Transmission Electron Microscopy (TEM), High Resolution Transmission Electron Microscopy (HRTEM), X-Ray Photoelectron Spectroscopy (XPS), and electrical conductivity measurement technique characterized the structure and physical characteristics of as-prepared SiC coating. At a constant acceleration potential drop, the electrical conductivity of the Si-C films deposed on C, increase with increasing of substrate temperature. On the other part, significant increases in the acceleration potential drop at constant substrate temperature lead to a variation of the crystallinity and electrical conductivity of the SiC coatings XPS analysis was performed using a Quantera SXM equipment, with monochromatic AlKα radiation at 1486.6eV. Electrical conductivity of the Si-C coating on carbon at different temperatures was measured comparing the potential drop on the sample with the potential drop on a series standard resistance in constant mode.

Paper Details

Date Published: 27 August 2014
PDF: 9 pages
Proc. SPIE 9172, Nanostructured Thin Films VII, 91720Y (27 August 2014); doi: 10.1117/12.2061186
Show Author Affiliations
Victor Ciupina, Univ. Ovidius Constanta (Romania)
Academy of Romanian Scientists (Romania)
Cristian P. Lungu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Rodica Vladoiu, Univ. Ovidius Constanta (Romania)
Gabriel C. Prodan, Univ. Ovidius Constanta (Romania)
Stefan Antohe, Univ. of Bucharest (Romania)
Corneliu Porosnicu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Iuliana Stanescu, Univ. Ovidius Constanta (Romania)
Ionut Jepu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Sorina Iftimie, Univ. of Bucharest (Romania)
Madalina Prodan, Univ. Ovidius Constanta (Romania)
Aurelia Mandes, Univ. Ovidius Constanta (Romania)
Virginia Dinca, Univ. Ovidius Constanta (Romania)
Eugeniu Vasile, Univ. Politehnica of Bucharest (Romania)
Valeriu Zarovski, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Virginia Nicolescu, Ceronav Constanta (Romania)

Published in SPIE Proceedings Vol. 9172:
Nanostructured Thin Films VII
Akhlesh Lakhtakia; Tom G. Mackay; Motofumi Suzuki, Editor(s)

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