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Proceedings Paper

Chromatic error correction of diffractive optical elements at minimum etch depths
Author(s): Jochen Barth; Tobias Gühne
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Paper Abstract

The integration of diffractive optical elements (DOE) into an optical design opens up new possibilities for applications in sensing and illumination. If the resulting optics is used in a larger spectral range we must correct not only the chromatic error of the conventional, refractive, part of the design but also of the DOE. We present a simple but effective strategy to select substrates which allow the minimum etch depths for the DOEs. The selection depends on both the refractive index and the dispersion.

Paper Details

Date Published: 25 September 2014
PDF: 6 pages
Proc. SPIE 9192, Current Developments in Lens Design and Optical Engineering XV, 91920J (25 September 2014); doi: 10.1117/12.2061000
Show Author Affiliations
Jochen Barth, Airbus Defence and Space (Germany)
Tobias Gühne, Airbus Defence and Space (Germany)

Published in SPIE Proceedings Vol. 9192:
Current Developments in Lens Design and Optical Engineering XV
R. Barry Johnson; Virendra N. Mahajan; Simon Thibault, Editor(s)

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