The method of high-density data recording by laser thermo-lithography with ion-beam etching was proposed. The nanocomposite films were created by the spin-coating method on basis of organic positive photoresist and added synthesized dyes characterized by absorption in the spectral region 390-410 nm and which are able to be evaporated by 405 nm laser radiation. The pits with 250 – 300 nm width were performed on the thin organic nanocomposite films by 405 nm laser beam focused by 0.85 NA lens. The organic nanocomposite film with obtained pits was used as a mask for reactive ion-beam etching of glass substrate. The 150 nm pits were performed on the substrate surface in the result of the laser thermo-lithography with ion-beam etching.

Date Published: 5 September 2014
PDF: 6 pages
Proc. SPIE 9201, Optical Data Storage 2014, 92010U (5 September 2014); doi: 10.1117/12.2060828

Published in SPIE Proceedings Vol. 9201:
Optical Data Storage 2014
Ryuichi Katayama; Thomas D. Milster, Editor(s)