
Proceedings Paper
Reflection on multilayer mirrors: beam profile and coherence propertiesFormat | Member Price | Non-Member Price |
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Paper Abstract
The main advantage of Bragg reflection from a multilayer mirror as a monochromator for hard X-rays, is the higher
photon flux density because of the larger spectral bandpass compared with crystal lattice reflection. The main
disadvantage lies in the strong modulations of the reflected beam profile. This is a major issue for micro-imaging
applications, where multilayer-based monochromators are frequently employed to deliver high photon flux density. A
subject of particular interest is the origin of the beam profile modifications, namely the irregular stripe patterns, induced
by the reflection on a multilayer. For multilayer coatings in general it is known that the substrate and its surface quality
significantly influence the performance of mirrors, as the coating reproduces to a certain degree the roughness and shape
of the substrate. This proceedings article reviews recent experiments that indicate potential options for producing wave
front-preserving multilayer mirrors, as well as new details on the particular mirrors our group has extensively studied in
the past.
Paper Details
Date Published: 17 September 2014
PDF: 7 pages
Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 92070V (17 September 2014); doi: 10.1117/12.2060801
Published in SPIE Proceedings Vol. 9207:
Advances in X-Ray/EUV Optics and Components IX
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)
PDF: 7 pages
Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 92070V (17 September 2014); doi: 10.1117/12.2060801
Show Author Affiliations
A. Rack, ESRF - The European Synchrotron (France)
C. Morawe, ESRF - The European Synchrotron (France)
L. Mancini, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
D. Dreossi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
D. Y. Parkinson, Lawrence Berkeley National Lab. (United States)
A. A. MacDowell, Lawrence Berkeley National Lab. (United States)
C. Morawe, ESRF - The European Synchrotron (France)
L. Mancini, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
D. Dreossi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
D. Y. Parkinson, Lawrence Berkeley National Lab. (United States)
A. A. MacDowell, Lawrence Berkeley National Lab. (United States)
F. Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
T. Rack, Novitom (France)
T. Holz, AXO Dresden GmbH (Germany)
M. Krämer, AXO Dresden GmbH (Germany)
R. Dietsch, AXO Dresden GmbH (Germany)
T. Rack, Novitom (France)
T. Holz, AXO Dresden GmbH (Germany)
M. Krämer, AXO Dresden GmbH (Germany)
R. Dietsch, AXO Dresden GmbH (Germany)
Published in SPIE Proceedings Vol. 9207:
Advances in X-Ray/EUV Optics and Components IX
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)
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