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Proceedings Paper

A trial for a reliable shape measurement using interferometry and deflectometry
Author(s): Ryohei Hanayama
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Paper Abstract

Phase measuring deflectometry is an emerging technique to measure specular complex surface, such as aspherical surface and free-form surface. It is very attractive for its wide dynamic range of vertical scale and application range. Because it is a gradient based surface profilometry, we have to integrate the measured data to get surface shape. It can be cause of low accuracy. On the other hand, interferometry is accurate and well-known method for precision shape measurement. In interferometry, the original measured data is phase of interference signal, which directly shows the surface shape of the target. However interferometry is too precise to measure aspherical surface, free-form surface and usual surface in common industry. To assure the accuracy in ultra-precision measurement, reliability is the most important thing. Reliability can be kept by cross-checking. Then I will propose measuring method using both interferometer and deflectometry for reliable shape measurement. In this concept, global shape is measured using deflectometry and local shape around flat area is measured using interferometry. The result of deflectometry is global and precise. But it include ambiguity due to slope integration. In interferometry, only a small area can be measured, which is almost parallel to the reference surface. But it is accurate and reliable. To combine both results, it should be global, precise and reliable measurement. I will present the concept of combination of interferometry and deflectometry and some preliminary experimental results.

Paper Details

Date Published: 18 August 2014
PDF: 6 pages
Proc. SPIE 9203, Interferometry XVII: Techniques and Analysis, 92030D (18 August 2014); doi: 10.1117/12.2060353
Show Author Affiliations
Ryohei Hanayama, The Graduate School for the Creation of New Photonics Industries (Japan)

Published in SPIE Proceedings Vol. 9203:
Interferometry XVII: Techniques and Analysis
Katherine Creath; Jan Burke; Joanna Schmit, Editor(s)

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