Share Email Print

Proceedings Paper

Dynamic compensation for the lithographic object lens
Author(s): Hongwei Zhu; Tingwen Xing; Zexiang Chen
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably.

Paper Details

Date Published: 8 September 2014
PDF: 6 pages
Proc. SPIE 9195, Optical System Alignment, Tolerancing, and Verification VIII, 91950P (8 September 2014); doi: 10.1117/12.2060302
Show Author Affiliations
Hongwei Zhu, Institute of Optics and Electronics (China)
Tingwen Xing, Institute of Optics and Electronics (China)
Zexiang Chen, Univ. of Electronic Science and Technology of China (China)

Published in SPIE Proceedings Vol. 9195:
Optical System Alignment, Tolerancing, and Verification VIII
José Sasián; Richard N. Youngworth, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?