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Proceedings Paper

Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing
Author(s): Mateusz Śmietana; Marcin Koba; Radoslaw Różycki-Bakon
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Paper Abstract

This paper presents a stack of silicon nitride (SiNx) nano-films deposited with radio-frequency plasma-enhanced chemical deposition (RF PECVD) method on single-mode fiber end-face for refractive index (RI) sensing. The stack consist of high (n~2.4) and low (n~1.9) refractive index (at λ=1550 nm) SiNx nano-films arranged alternately. As a result of the experiment where 5 nano-layers were deposited, we received down to -30 dB-deep resonance in reflection spectrum at about λ=1550 nm. In the proposed sensing scheme both reflected power and wavelength of the resonance can be used for external RI measurements.

Paper Details

Date Published: 2 June 2014
PDF: 4 pages
Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors, 91575F (2 June 2014); doi: 10.1117/12.2059770
Show Author Affiliations
Mateusz Śmietana, Warsaw Univ. of Technology (Poland)
Marcin Koba, Warsaw Univ. of Technology (Poland)
National Institute of Telecommunications (Poland)
Radoslaw Różycki-Bakon, Warsaw Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 9157:
23rd International Conference on Optical Fibre Sensors
José M. López-Higuera; Julian D. C. Jones; Manuel López-Amo; José Luis Santos, Editor(s)

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