Proceedings Paper
Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing| Format | Member Price | Non-Member Price |
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Paper Abstract
This paper presents a stack of silicon nitride (SiNx) nano-films deposited with radio-frequency plasma-enhanced chemical deposition (RF PECVD) method on single-mode fiber end-face for refractive index (RI) sensing. The stack consist of high (n~2.4) and low (n~1.9) refractive index (at λ=1550 nm) SiNx nano-films arranged alternately. As a result of the experiment where 5 nano-layers were deposited, we received down to -30 dB-deep resonance in reflection spectrum at about λ=1550 nm. In the proposed sensing scheme both reflected power and wavelength of the resonance can be used for external RI measurements.
Paper Details
Date Published: 2 June 2014
PDF: 4 pages
Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors, 91575F (2 June 2014); doi: 10.1117/12.2059770
Published in SPIE Proceedings Vol. 9157:
23rd International Conference on Optical Fibre Sensors
José M. López-Higuera; Julian D. C. Jones; Manuel López-Amo; José Luis Santos, Editor(s)
PDF: 4 pages
Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors, 91575F (2 June 2014); doi: 10.1117/12.2059770
Show Author Affiliations
Mateusz Śmietana, Warsaw Univ. of Technology (Poland)
Marcin Koba, Warsaw Univ. of Technology (Poland)
National Institute of Telecommunications (Poland)
Marcin Koba, Warsaw Univ. of Technology (Poland)
National Institute of Telecommunications (Poland)
Radoslaw Różycki-Bakon, Warsaw Univ. of Technology (Poland)
Published in SPIE Proceedings Vol. 9157:
23rd International Conference on Optical Fibre Sensors
José M. López-Higuera; Julian D. C. Jones; Manuel López-Amo; José Luis Santos, Editor(s)
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