A structure and method for coating Nano Imprint Lithography (NIL) masks is described. The approach uses conformal ALD layering methods and sequential monomolecular depositions. The processes describe chemically bonded, high density, smooth coatings having fractional fluorine terminations. Various molecular precursor mixtures or various reactive surface site chemical functionalization schemes allow the attainment of controlled percentages of fractional F-terminations. The percentage of fluorine terminations is adjustable and controllable from 0% to 100%. Chemistries are described that result in coating layers of the order of ~1nm. These fractional F-terminated coatings may be useful for the reduction and minimization of defects in advanced imprint lithography processes.

Date Published: 28 March 2014
PDF: 8 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491S (28 March 2014); doi: 10.1117/12.2057117

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)