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Proceedings Paper

The REBL DPG: recent innovations and remaining challenges
Author(s): Allen Carroll; Luca Grella; Kirk Murray; Mark A. McCord; Paul Petric; William M. Tong; Christopher F. Bevis; Shy-Jay Lin; Tsung-Hsin Yu; Tze-Chiang Huang; T. P. Wang; Wen-Chuan Wang; J. J. Shin
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Paper Abstract

Reflective electron-beam lithography (REBL) employs a novel device to impress pattern information on an electron beam. This device, the digital pattern generator (DPG), is an array of small electron reflectors, in which the reflectance of each mirror is controlled by underlying CMOS circuitry. When illuminated by a beam of low-energy electrons, the DPG is effectively a programmable electron-luminous image source. By switching the mirror drive circuits appropriately, the DPG can ‘scroll’ the image of an integrated circuit pattern across its surface; and the moving electron image, suitably demagnified, can be used to expose the resist-coated surface of a wafer or mask. This concept was first realized in a device suitable for 45 nm lithography demonstrations. A next-generation device has been designed and is presently nearing completion. The new version includes several advances intended to make it more suitable for application in commercial lithography systems. We will discuss the innovations and compromises in the design of this next-generation device. For application in commercially-practical maskless lithography at upcoming device nodes, still more advances will be needed. Some of the directions in which this technology can be extended will be described.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904917 (28 March 2014); doi: 10.1117/12.2048528
Show Author Affiliations
Allen Carroll, KLA-Tencor Corp. (United States)
Luca Grella, KLA-Tencor Corp. (United States)
Kirk Murray, KLA-Tencor Corp. (United States)
Mark A. McCord, KLA-Tencor Corp. (United States)
Paul Petric, KLA-Tencor Corp. (United States)
William M. Tong, KLA-Tencor Corp. (United States)
Christopher F. Bevis, KLA-Tencor Corp. (United States)
Shy-Jay Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Tsung-Hsin Yu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Tze-Chiang Huang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
T. P. Wang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Wen-Chuan Wang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
J. J. Shin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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