Share Email Print

Proceedings Paper

Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools
Author(s): Antoine Wojdyla; Ryan Miyakawa; Patrick Naulleau
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We present a novel approach for wavefront sensing based on scanning diffraction imaging suitable for high-NA optics inspection, where common metrology techniques show limitations. This approach employs ptychography, whereby a well-characterized object is scanned at the focus of the aberrated test optic, and the resulting scat tered light is captured on a CCD. Under the Fresnel approximation, the diffraction patterns are processed in an iterative algorithm to reconstruct the test optic aberrations. We discuss the applicability of this wavefront metrology, present numerical simulations that validate the reconstruction, and show first experimental results from an optical prototype.

Paper Details

Date Published: 17 April 2014
PDF: 5 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904839 (17 April 2014); doi: 10.1117/12.2048386
Show Author Affiliations
Antoine Wojdyla, Lawrence Berkeley National Lab. (United States)
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood II; Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?