As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the architecture provides dose control and improved spectral bandwidth stability, both of which enables superior CD control and wafer yield for the chipmaker. The XLR 660ix incorporates new controller technology called ETC for improvements in spectral bandwidth stability, energy dose stability, and wavelength stability. This translates to improved CD control and higher wafer yields. The authors will discuss the impact that these improvements will have in advanced lithography applications.

Date Published: 31 March 2014
PDF: 5 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90521H (31 March 2014); doi: 10.1117/12.2048305

Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)