
Proceedings Paper
Improvements in bandwidth and wavelength control for XLR 660xi systemsFormat | Member Price | Non-Member Price |
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Paper Abstract
As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer
needs, Cymer continues developing light sources that enable advanced lithography, and
introducing innovations to improve productivity, wafer yield, and cost of ownership. In
particular, the architecture provides dose control and improved spectral bandwidth stability,
both of which enables superior CD control and wafer yield for the chipmaker.
The XLR 660ix incorporates new controller technology called ETC for improvements in spectral
bandwidth stability, energy dose stability, and wavelength stability. This translates to improved
CD control and higher wafer yields. The authors will discuss the impact that these
improvements will have in advanced lithography applications.
Paper Details
Date Published: 31 March 2014
PDF: 5 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90521H (31 March 2014); doi: 10.1117/12.2048305
Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)
PDF: 5 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90521H (31 March 2014); doi: 10.1117/12.2048305
Show Author Affiliations
Will Conley, Cymer, an ASML company (United States)
Hoang Dao, Cymer, an ASML company (United States)
David Dunlap, Cymer, an ASML company (United States)
Ronnie P. Flores, Canon Inc. (United States)
Matt Lake, Cymer, an ASML company (United States)
Kevin O'Brien, Cymer, an ASML company (United States)
Hoang Dao, Cymer, an ASML company (United States)
David Dunlap, Cymer, an ASML company (United States)
Ronnie P. Flores, Canon Inc. (United States)
Matt Lake, Cymer, an ASML company (United States)
Kevin O'Brien, Cymer, an ASML company (United States)
Alicia Russin, Cymer, an ASML company (United States)
Aleks Simic, Cymer, an ASML company (United States)
Josh Thornes, Cymer, an ASML company (United States)
Brian Wehrung, Cymer, an ASML company (United States)
John Wyman, Cymer, an ASML company (United States)
Aleks Simic, Cymer, an ASML company (United States)
Josh Thornes, Cymer, an ASML company (United States)
Brian Wehrung, Cymer, an ASML company (United States)
John Wyman, Cymer, an ASML company (United States)
Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)
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