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Proceedings Paper

High volume nanoscale roll-based imprinting using jet and flash imprint lithography
Author(s): Se Hyun Ahn; Michael Miller; Shuqiang Yang; Maha Ganapathisubramanian; Marlon Menezes; Vik Singh; Fen Wan; Jin Choi; Frank Xu; Dwayne LaBrake; Douglas J. Resnick; Paul Hofemann; S. V. Sreenivasan
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Paper Abstract

Extremely large-area roll-to-roll manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. The challenge is to extend this approach to the realm of nanopatterning and realize similar benefits. Display applications, including liquid crystal (LCD), organic light emitting diode (OLED) and flexible displays are particularly interesting because of the ability to impact multiple levels in the basic display. Of particular interest are the polarizer, DBEF, thin film transistor and color filter; roll-based imprinting has the opportunity to create high performance components within the display while improving the cost of ownership of the panel. Realization of these devices requires both a scalable imprinting technology and tool. In this paper, we introduce a high volume roll-based nanopatterning system, the LithoFlex 350TM. The LithoFlex 350 uses an inkjet based imprinting process similar to the technology demonstrator tool, the LithoFlex 100, introduced in 2012. The width of the web is 350mm and patterning width is 300mm. The system can be configured either for Plate-to-Roll (P2R) imprinting (in which a rigid template is used to pattern the flexible web material) or for Roll-to-Plate imprinting (R2P) (in which a web based template is used to pattern either wafers or panels). Also described in this paper are improvements to wire grid polarizer devices. By optimizing the deposition, patterning and etch processes, we have been able to create working WGPs with transmittance and extinction ratios as high as 44% and 50,000, respectively.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490G (28 March 2014); doi: 10.1117/12.2048172
Show Author Affiliations
Se Hyun Ahn, Molecular Imprints, Inc. (United States)
Michael Miller, Molecular Imprints, Inc. (United States)
Shuqiang Yang, Molecular Imprints, Inc. (United States)
Maha Ganapathisubramanian, Molecular Imprints, Inc. (United States)
Marlon Menezes, Molecular Imprints, Inc. (United States)
Vik Singh, Molecular Imprints, Inc. (United States)
Fen Wan, Molecular Imprints, Inc. (United States)
Jin Choi, Molecular Imprints, Inc. (United States)
Frank Xu, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
Paul Hofemann, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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