
Proceedings Paper
Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: Part 2Format | Member Price | Non-Member Price |
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Paper Abstract
Patterning uncertainty in EUV lithography arises from each lithographic component: the source, the photomask, the
optical system, and the photoresist. All contribute to line roughness and contact disuniformity. In extreme cases, feature
variability can result in patterning failures such as line microbridging or random missing contact holes.
Historically, redundant contact holes (or vias) were placed to overcome the effects of a missing contact. Due to the
aggressive CD shrink of feature size, the use of redundant contacts has been progressively decreased. For some types of
devices, almost every contact of the billions found on the chip must be electrically active in order for the device to
function. In such scenario, lithographic printing failures may cause catastrophic loss of yield, considering that closed
contacts can hardly be corrected by smoothing techniques or etching.
In this paper, the minimum contact CD which prints without failure – the contact hole printability limit – is studied for
54nm and 44nm pitch dense arrays. We find that the same resist may show dramatically different printability limits
depending upon sizing dose and illumination conditions. This analysis will be implemented to estimate, through
simulation-assisted experiments, the required exposure dose and aerial image to safely print sub-30nm contact holes.
Paper Details
Date Published: 18 March 2014
PDF: 10 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904834 (18 March 2014); doi: 10.1117/12.2048062
Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood II; Eric M. Panning, Editor(s)
PDF: 10 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904834 (18 March 2014); doi: 10.1117/12.2048062
Show Author Affiliations
Alessandro Vaglio Pret, KLA-Tencor/ ICOS Belgium (Belgium)
IMEC (Belgium)
Peter De Bisschop, IMEC (Belgium)
IMEC (Belgium)
Peter De Bisschop, IMEC (Belgium)
Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood II; Eric M. Panning, Editor(s)
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