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Proceedings Paper

EUV source-mask optimization for 7nm node and beyond
Author(s): Xiaofeng Liu; Rafael Howell; Stephen Hsu; Kaiyu Yang; Keith Gronlund; Frank Driessen; Hua-Yu Liu; Steven Hansen; Koen van Ingen Schenau; Thijs Hollink; Paul van Adrichem; Kars Troost; Jörg Zimmermann; Oliver Schumann; Christoph Hennerkes; Paul Gräupner
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Paper Abstract

In this paper we introduce new source-mask co-optimization (SMO) capabilities for EUV with specific support of the details of imaging with NXE:33×0 scanners. New algorithms have been developed that fully exploit the adjustability of the light distribution inside the NXE:33×0 flexible illuminator, FlexPupil. The fast NXE M3D+ model accurately predicts the reflective 3D mask effects and enables novel pupil symmetries and mask defocus optimization. This mitigates the H-V bias, Bossung tilt, and pattern shift caused by shadowing and non-telecentricity, and reduces the sensitivity to flare. New pupil optimization flows will be shown. The optimized pupils are fully compliant with NXE:33×0 scanner specifications. We will demonstrate enhanced imaging performance of this NXE specific SMO on 7 nm node logic cut masks and show benefits up to 20% improved CD uniformity, and a reduction in the maximum pattern shifts.

Paper Details

Date Published: 17 April 2014
PDF: 11 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480Q (17 April 2014); doi: 10.1117/12.2047584
Show Author Affiliations
Xiaofeng Liu, ASML Brion (United States)
Rafael Howell, ASML Brion (United States)
Stephen Hsu, ASML Brion (United States)
Kaiyu Yang, ASML Brion (United States)
Keith Gronlund, ASML Brion (United States)
Frank Driessen, ASML Brion (United States)
Hua-Yu Liu, ASML Brion (United States)
Steven Hansen, ASML Technology Development Ctr. (United States)
Koen van Ingen Schenau, ASML Netherlands B.V. (Netherlands)
Thijs Hollink, ASML Netherlands B.V. (Netherlands)
Paul van Adrichem, ASML Netherlands B.V. (Netherlands)
Kars Troost, ASML Netherlands B.V. (Netherlands)
Jörg Zimmermann, Carl Zeiss SMT GmbH (Germany)
Oliver Schumann, Carl Zeiss SMT GmbH (Germany)
Christoph Hennerkes, Carl Zeiss SMT GmbH (Germany)
Paul Gräupner, Carl Zeiss SMT GmbH (Germany)

Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood II; Eric M. Panning, Editor(s)

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