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Proceedings Paper

Clean and stable LPP light source for HVM inspection applications
Author(s): Bob Rollinger; Nadia Gambino; Andrea Z. Giovannini; Luna S. Bozinova; Flori Alickaj; Konrad Hertig; Reza S. Abhari; Fariba Abreau
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Paper Abstract

At the Laboratory for Energy Conversion, ETH Zurich a new tin droplet-based laser-produced plasma source with application in EUV lithography is operational since Q3 2013. The EUV source ALPS II is equipped with a large capacity droplet dispenser and a high power (kW), high repetition rate (>6 kHz) Nd:YAG laser. The new source should address the requirements of high volume manufacturing for different inspection and metrology applications found in EUV lithography. The average source brightness is equal to 350 W/mm2sr. Individual droplet tracking in time and space, which is coupled to a droplet positioning and triggering system helps to increase the pulse-to-pulse EUV emission stability of the source. The lateral droplet stability is on the order of 10-15% of the droplet diameter. The individual droplet triggering yields deviations between the laser trigger and the droplet passage time at the irradiation site of less than 1 us, even for large droplet timing fluctuations (>5%). The in-band EUV radiation is measured with an energy monitor, which is coupled to a fast analog hardware-based integrator. The pulse-to-pulse EUV energy stability for high stability data equals 3% (σ). In the case of window-averaged (0.1 s) data, the EUV stability equals 0.86% (σ). Low stability data is also reported. The large brightness of the presented LPP-based light source can be tuned to adjust the EUV light stability that is required by the inspection tool.

Paper Details

Date Published: 17 April 2014
PDF: 9 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90482K (17 April 2014); doi: 10.1117/12.2046416
Show Author Affiliations
Bob Rollinger, ETH Zürich (Switzerland)
Nadia Gambino, ETH Zürich (Switzerland)
Andrea Z. Giovannini, ETH Zürich (Switzerland)
Luna S. Bozinova, ETH Zürich (Switzerland)
Flori Alickaj, ETH Zürich (Switzerland)
Konrad Hertig, ETH Zürich (Switzerland)
Reza S. Abhari, ETH Zürich (Switzerland)
Fariba Abreau, Adlyte Ltd. (Switzerland)

Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood II; Eric M. Panning, Editor(s)

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