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Proceedings Paper

Characterization of two-photon polymerization process using Raman microspectroscopy
Author(s): L. J. Jiang; Y. S. Zhou; W. Xiong; Y. Gao; T. Baldacchini; J.-F. Silvain; L. Jiang; Y. F. Lu
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Paper Abstract

Two-photon polymerization (TPP) is a promising micro/nanofabrication technique, which is capable of fabricating 3D micro/nanostructures beyond the diffraction limit of light. However, the study of TPP process with a focus on the dependence of degree of conversion on TPP parameters using a non-destructive and efficient method is still lacking. We studied the quantitative relationships between the TPP parameters and the cross-linking of an acrylic-based IP-L 780 photoresist via systematic Raman characterization. The differences in the Raman spectra between the non-polymerized and the polymerized IP-L 780 photoresists were observed by probing the excitation of carbon-carbon double bond (C=C) vibrations. We obtained the relationship between the degree of conversion in TPP and the Raman spectra of the IP-L 780 resin, in which the intensity of the characteristic Raman peak of IP-L 780 at 1635 cm-1 decreases with the increase of the TPP laser dose. A mathematic model of the degree of conversion with respective to the TPP parameters, including laser average power and writing speed, has been established. The method provides a simple and effective way to characterize and optimize the TPP micro/nanofabrication processes. The established model for the degree of conversion as the function of TPP parameters will contribute to the advanced 3D TPP micro/nanofabrication by providing a guidance to optimize the laser doses, voxel sizes, and the mechanical strength of the polymers.

Paper Details

Date Published: 7 March 2014
PDF: 6 pages
Proc. SPIE 8969, Synthesis and Photonics of Nanoscale Materials XI, 896909 (7 March 2014); doi: 10.1117/12.2041778
Show Author Affiliations
L. J. Jiang, Univ. of Nebraska-Lincoln (United States)
Y. S. Zhou, Univ. of Nebraska-Lincoln (United States)
W. Xiong, Univ. of Nebraska-Lincoln (United States)
Y. Gao, Univ. of Nebraska-Lincoln (United States)
T. Baldacchini, Univ. of Nebraska-Lincoln (United States)
Newport Corp. (United States)
J.-F. Silvain, Univ. of Nebraska-Lincoln (United States)
Institut de Chimie de la Matière Condensée de Bordeaux, CNRS, Univ. Bordeaux 1 (France)
L. Jiang, Beijing Institute of Technology (China)
Y. F. Lu, Univ. of Nebraska-Lincoln (United States)

Published in SPIE Proceedings Vol. 8969:
Synthesis and Photonics of Nanoscale Materials XI
David B. Geohegan; Frank Träger; Jan J. Dubowski, Editor(s)

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