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Proceedings Paper

Determination of carrier diffusion length in p- and n-type GaN
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Paper Abstract

Diffusion lengths of photo-excited carriers along the c-direction were determined from photoluminescence (PL) measurements in p- and n-type GaN epitaxial layers grown on c-plane sapphire by metal-organic chemical vapor deposition. The investigated samples incorporate a 6 nm thick In0.15Ga0.85N active layer capped with either 500 nm p- GaN or 1300 nm n-GaN. The top GaN layers were etched in steps and PL from the InGaN active region and the underlying layers was monitored as a function of the top GaN thickness upon photogeneration near the surface region by above bandgap excitation. Taking into consideration the absorption in the active and underlying layers, the diffusion lengths at 295 K and at 15 K were measured to be about 92 ± 7 nm and 68 ± 7 nm for Mg-doped p-type GaN and 432 ± 30 nm and 316 ± 30 nm for unintentionally doped n-type GaN, respectively. Cross-sectional cathodoluminescence line-scan measurement was performed on a separate sample and the diffusion length in n-type GaN was measured to be 280 nm.

Paper Details

Date Published: 8 March 2014
PDF: 6 pages
Proc. SPIE 8986, Gallium Nitride Materials and Devices IX, 89862C (8 March 2014); doi: 10.1117/12.2040645
Show Author Affiliations
Shopan Hafiz, Virginia Commonwealth Univ. (United States)
Sebastian Metzner, Otto-von-Guericke-Univ. Magdeburg (Germany)
Fan Zhang, Virginia Commonwealth Univ. (United States)
Morteza Monavarian, Virginia Commonwealth Univ. (United States)
Vitaliy Avrutin, Virginia Commonwealth Univ. (United States)
Hadis Morkoç, Virginia Commonwealth Univ. (United States)
Christopher Karbaum, Otto-von-Guericke-Univ. Magdeburg (Germany)
Frank Bertram, Otto-von-Guericke-Univ. Magdeburg (Germany)
Jürgen Christen, Otto-von-Guericke-Univ. Magdeburg (Germany)
Bernard Gil, Univ. Montpellier 2 (France)
Ümit Özgür, Virginia Commonwealth Univ. (United States)

Published in SPIE Proceedings Vol. 8986:
Gallium Nitride Materials and Devices IX
Jen-Inn Chyi; Yasushi Nanishi; Hadis Morkoç; Joachim Piprek; Euijoon Yoon; Hiroshi Fujioka, Editor(s)

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