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Proceedings Paper

Deposition and characterization of sputtered vanadium dioxide films
Author(s): Christopher C.H. Hale; James S. Orr; H. Gordon; H. J. Orr; Leonard T. Traub; Keith L. Lewis
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Paper Abstract

Reactive RF planar magnetron sputtering has been used to deposit thin films of vanadium dioxide onto silicon and germanium substrates. The present work demonstrates the feasibility of reliably reproducing stoichiometric material by this method. The films exhibit a sharply defined transition in optical properties. The temperature over which the transition occurs is examined. Attention has been given to determination of the structure of the vanadium dioxide and the relation to the switching properties. X-ray diffraction techniques were employed to assess structural purity. Fine surface texture has been evaluated using a high resolution stylus instrument and some relation to optical scatter loss is made. The optical transmission of an enhanced transmission thermal switching device incorporating a vanadium dioxide film is reported.

Paper Details

Date Published: 1 August 1990
PDF: 15 pages
Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); doi: 10.1117/12.20379
Show Author Affiliations
Christopher C.H. Hale, OCLI Optical Coatings Ltd. (United Kingdom)
James S. Orr, OCLI Optical Coatings Ltd. (United Kingdom)
H. Gordon, OCLI Optical Coatings Ltd. (United Kingdom)
H. J. Orr, OCLI Optical Coatings Ltd. (United Kingdom)
Leonard T. Traub, OCLI Optical Coatings Ltd. (United Kingdom)
Keith L. Lewis, Royal Signals and Radar Establishment (United Kingdom)

Published in SPIE Proceedings Vol. 1270:
Optical Thin Films and Applications
Reinhard Herrmann, Editor(s)

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