
Proceedings Paper
Influence of hole diameter on the average size and quantity distribution of Si nanoparticlesFormat | Member Price | Non-Member Price |
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Paper Abstract
The single crystalline Si target with high resistivity was ablated by a XeCl excimer laser (wavelength 308nm) in pure Ar
gas under the ambient pressure of 10 Pa. The mask with a 1-10 mm diameter hole in the center was placed at a distance
of 1.5 cm to the Si target. The Si nanocrystalline films were systemically deposited on a glass or single crystalline Si
substrate placed behind the mask parallelly with a distance of 1.0 cm. The Raman and X-ray diffraction spectra indicate
that the films were nanocrystalline. Scanning electron microscope images of the films showed that the diameter of the
hole affected on the quantity and distributed range of Si nanoparticles on the substrate. It was obtained that the average
size of Si nanoparticles decreasing with the diameter of the hole increasing, the quantity of Si nanoparticles was
proportional to the power of 1.5 of the hole diameter. It is the nonlinear dynamic process to lead to the experimental
result.
Paper Details
Date Published: 21 December 2013
PDF: 5 pages
Proc. SPIE 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication, 904707 (21 December 2013); doi: 10.1117/12.2036952
Published in SPIE Proceedings Vol. 9047:
2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication
Zhiping Zhou; Changhe Zhou; Zhiping Zhou, Editor(s)
PDF: 5 pages
Proc. SPIE 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication, 904707 (21 December 2013); doi: 10.1117/12.2036952
Show Author Affiliations
Xuecheng Ding, Hebei Univ. (China)
Hongdong Zhao, Hebei Univ. of Technology (China)
Yinglong Wang, Hebei Univ. (China)
Hongdong Zhao, Hebei Univ. of Technology (China)
Yinglong Wang, Hebei Univ. (China)
Published in SPIE Proceedings Vol. 9047:
2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication
Zhiping Zhou; Changhe Zhou; Zhiping Zhou, Editor(s)
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