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Proceedings Paper

Influence of deposition parameters on optical properties of titanium nitride thin films
Author(s): Viorel Braic; Mariana Braic; Gabriela Pavelescu; Dorin Melinte; Dana Necsoiu
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Paper Abstract

The thin titanium nitride films deposited on glass in a planar d.c. magnetron configuration have been optically investigated. The influence of the nitrogen partial pressure, substrate bias and film thickness as deposition parameters on the transmission (Vis) and the reflectance (Vis, FIR) spectra of the samples was studied. The analysis of surface properties of TiN films was also made by spectroscopic ellipsometry for different deposition conditions. The data were compared with the similar spectrum of a gold evaporated film.

Paper Details

Date Published: 8 March 1995
PDF: 3 pages
Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); doi: 10.1117/12.203490
Show Author Affiliations
Viorel Braic, Institute of Optoelectronics (Romania)
Mariana Braic, Institute of Optoelectronics (Romania)
Gabriela Pavelescu, Institute of Physics and Technology of Materials (Romania)
Dorin Melinte, Institute of Optoelectronics (Romania)
Dana Necsoiu, Institute of Optoelectronics (Romania)

Published in SPIE Proceedings Vol. 2461:
ROMOPTO '94: Fourth Conference in Optics
Valentin I. Vlad, Editor(s)

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