The NSF Nanomanufacturing Program supports fundamental research in novel methods and techniques for batch and continuous processes, and top-down and bottom-up processes leading to the formation of complex nanostructures, nanodevices and nanosystems. The program leverages advances in the understanding of nano-scale phenomena and processes, nanomaterials discovery, novel nanostructure architectures, innovative nanodevice and nanosystem design. It seeks to address issues such as quality, efficiency, scalability, reliability, safety and affordability. The program encourages research in the development of new nano-scale processes and production systems based on computation, modeling and simulation and use of process sensing, monitoring, and control. Research in instrumentation and metrology is an integral part of the program. Additionally, the program supports education of the next generation of researchers, and encourages building a workforce trained in nanotechnology and nanomanufacturing systems. It is also interested in understanding long-term societal implications of large-scale production and use of nano-scale materials. For this, it encourages the development of standards. This paper will describe the program philosophy.

Date Published: 20 September 2013
PDF: 5 pages
Proc. SPIE 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII, 88190A (20 September 2013); doi: 10.1117/12.2033963

Published in SPIE Proceedings Vol. 8819:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
Michael T. Postek; Ndubuisi George Orji, Editor(s)