
Proceedings Paper
2013 mask industry surveyFormat | Member Price | Non-Member Price |
---|---|---|
$17.00 | $21.00 |
Paper Abstract
A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as
an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics
including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance,
and returns were included and new topics were added. Within each category are multiple questions that result in a
detailed profile of both the business and technical status of the mask industry.
While each year’s survey includes minor updates based on feedback from past years and the need to collect additional
data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of
improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining
the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top
challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per
mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the
historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding
of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for
Semiconductors (ITRS).
Paper Details
Date Published: 20 September 2013
PDF: 16 pages
Proc. SPIE 8880, Photomask Technology 2013, 88800K (20 September 2013); doi: 10.1117/12.2033255
Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)
PDF: 16 pages
Proc. SPIE 8880, Photomask Technology 2013, 88800K (20 September 2013); doi: 10.1117/12.2033255
Show Author Affiliations
Matt Malloy, SEMATECH Inc. (United States)
Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)
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