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Proceedings Paper

Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask
Author(s): Hideomi Hashiba; Yuta Miyazaki; Sachiko Matsushita
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Paper Abstract

Titanium dioxide (TiO2) has been draw attention for wide range of applications from photonic crystals for visible light range by its catalytic characteristics to tera-hertz range by its high refractive index. We present an experimental study of fabrication of fine structures of TiO2 with a ZEP electron beam resist mask followed by Ti sputter deposition techniques. A TiO2 thin layer of 150 nm thick was grown on an FTO glass substrate with a fine patterned ZEP resist mask by a conventional RF magnetron sputter method with Ti target. The deposition was carried out with argon-oxygen gases at a pressure of 5.0 x 10 -1 Pa in a chamber. During the deposition, ratio of Ar-O2 gas was kept to the ratio of 2:1 and the deposition ratio was around 0.5 Å/s to ensure enough oxygen to form TiO2 and low temperature to avoid deformation of fine pattern of the ZPU resist mask. Deposited TiO2 layers are white-transparent, amorphous, and those roughnesses are around 7 nm. Fabricated TiO2 PCs have wider TiO2 slabs of 112 nm width leaving periodic 410 x 410 nm2 air gaps. We also studied transformation of TiO2 layers and TiO2 fine structures by baking at 500 °C. XRD measurement for TiO2 shows that the amorphous TiO2 transforms to rutile and anatase forms by the baking while keeping the same profile of the fine structures. Our fabrication method can be one of a promising technique to optic devices on researches and industrial area.

Paper Details

Date Published: 26 September 2013
PDF: 6 pages
Proc. SPIE 8816, Nanoengineering: Fabrication, Properties, Optics, and Devices X, 88161F (26 September 2013); doi: 10.1117/12.2024360
Show Author Affiliations
Hideomi Hashiba, Nihon Univ. (Japan)
Yuta Miyazaki, Nihon Univ. (Japan)
Sachiko Matsushita, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 8816:
Nanoengineering: Fabrication, Properties, Optics, and Devices X
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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